gigalane

Features

Uses automated equipment
- World's first automation in wafer scale, fully automated imprinting process, wafer load/unload, coating, imprinting

- Mass production through automation: minimizes error and contamination
Lowered CoC/CoO
- CoC reduction through mold that withstands repetitive use

- Low investment and maintenance cost via throughput in contrast to stepper(CoO)
Vacuum-assisted UV imprinting
- Makes nanometered ultra-micro patterns and micrometered micro-patterns

- We have secured air void defectiveness prevention and high pattern reproduction rate in hole, pillar, wall, and trench patterns

- We have obtained production capability which readily manufactures patterns not feasible with 3D lens, lenticular and other general photo process

- Applicable in various substrate type(glass, wafer, film)

- Applicable in various substrate size(4-inch ~ 8-inch)

- World's best capacity in controlling remaining film thickness: fabrication and reproduction of wafer-scale uniform film thickness

Provides various model lineup according to the imprint process

Gigalane NANO-IMPRINTER	CITUS 6000FA

	Fully automatic Imprinter
Overview & Performance	- 4" ~ 6" wafer imprinting - Sub-100nm pattern resolution (Comparable with KrF scanner) - Fully automatic operation : Master mold → mold → imprint, no operator intervention - System integration, CITUS6000M(mold imprinter) + 6000R(wafer imprinter), in-line opertation - Easy job change(flexible pattern change while operation) variours master wafers can be loaded without any delay or loss during master change - Master mold loading : 12" ~ 8" wafer(cassette loading) - Motion monitoring systerm : Coating, imprintinig, wafer delivery, film moving, on-line CAM record - Resin mold repeatable (multiple usage) : Gaseous release coater in-line - Lower CoC & CoO : cost of consumable, cost of ownership - Very small footprint & simple process against photo stepper & wet(coating, developing) - LED, Display, Other Electric Devices PSS, Micro Lens Array, 3D structure, slanted structure and nano~micro scale patterning - Nomial monthly capacity : 30K/month, 60 wph(wafer per hour)

Gigalane NANO-IMPRINTER	CITUS 6000M for Mold	CITUS 6000R	CITUS 6000SA

	Mold Imprinter	Auto Imprinter	Manual Imprinter
Overview	- Master mold : 6inch ~ 12inch - Resin mold roll production - In-line Resin Coating (spray, ink jet, u-dispenser) - Roll to Plate Contact imprint - UV imprint(365nm)	- 4inch ~ 6inch - LED, Display, Optical Devices - Flexible Resin Mold(Roll to Roll) - In-line Coater(spin coater) - In-line Gaeous release treatment - Vacuum assisted UV imprint(365nm)	- 4inch ~ 6inch, Manual type - LED, Display, Optical Devices - Flexible Resin Mold - Coater/Demold optional - Vacuum assisted UV imprint(365nm)
Performance	- 20nm Pattern Resolution - Lower CoC & CoO - Monthly Capa. : 30K - Direct mold fabrication from master mold	- 20nm Pattern Resolution - Lower CoC & CoO - Small footprint against photo Litho - Comparable to KrF, i-line Stepper - Monthly Capa. : 30K	- 20nm Pattern Resolution - Long life time sheet type mold - Easy loading / unloading - Easy job Change(Mold change) - R&D for WGP, nPSS, Fine nano pattern

Process Data