gigalane

Features

자동화 장비 운용
- 세계 최초 wafer scale full automated imprinting process wafer load/unload, coating, imprinting 공정 자동화

- 자동화 구현을 통한 양산성 확보 : error 최소화 및 오염 최소화
Low CoC/CoO 구현
- 반복 사용이 가능한 mold를 통한 CoC 절감

- Stepper 대비 월등한 throughput으로 낮은 투자비용 및 유지비용 시현(CoO)
진공 UV imprint 공정
- 수십nm 급 초미세패턴부터 um 급 미세패턴 구현

- hole, pillar, wall, trench 등 대부분의 패턴에서 air void 불량 방지 및 높은 패턴 복제율 확보

- 3D lens, lenticular 등 일반적인 photo 공정으로 구현이 불가능한 패턴의 손쉬운 생산능력 보유

- 다양한 기판의 적용성(glass, wafer,film)

- 다양한 기판사이즈 적용성(4inch ~ 8inch)

- 세계 최고 수준의 정밀한 잔막 제어 능력 : wafer scale 균일 잔막 구현 및 재현성 확보

Imprint 공정에 따른 다양한 model line up 제공

Gigalane NANO-IMPRINTER	CITUS 6000FA

	Fully automatic Imprinter
Overview & Performance	- 4" ~ 6" wafer imprinting - Sub-100nm pattern resolution (Comparable with KrF scanner) - Fully automatic operation : Master mold → mold → imprint, no operator intervention - System integration, CITUS6000M(mold imprinter) + 6000R(wafer imprinter), in-line opertation - Easy job change(flexible pattern change while operation) variours master wafers can be loaded without any delay or loss during master change - Master mold loading : 12" ~ 8" wafer(cassette loading) - Motion monitoring systerm : Coating, imprintinig, wafer delivery, film moving, on-line CAM record - Resin mold repeatable (multiple usage) : Gaseous release coater in-line - Lower CoC & CoO : cost of consumable, cost of ownership - Very small footprint & simple process against photo stepper & wet(coating, developing) - LED, Display, Other Electric Devices PSS, Micro Lens Array, 3D structure, slanted structure and nano~micro scale patterning - Nomial monthly capacity : 30K/month, 60 wph(wafer per hour)

Gigalane NANO-IMPRINTER	CITUS 6000M for Mold	CITUS 6000R	CITUS 6000SA

	Mold Imprinter	Auto Imprinter	Manual Imprinter
Overview	- Master mold : 6inch ~ 12inch - Resin mold roll production - In-line Resin Coating (spray, ink jet, u-dispenser) - Roll to Plate Contact imprint - UV imprint(365nm)	- 4inch ~ 6inch - LED, Display, Optical Devices - Flexible Resin Mold(Roll to Roll) - In-line Coater(spin coater) - In-line Gaeous release treatment - Vacuum assisted UV imprint(365nm)	- 4inch ~ 6inch, Manual type - LED, Display, Optical Devices - Flexible Resin Mold - Coater/Demold optional - Vacuum assisted UV imprint(365nm)
Performance	- 20nm Pattern Resolution - Lower CoC & CoO - Monthly Capa. : 30K - Direct mold fabrication from master mold	- 20nm Pattern Resolution - Lower CoC & CoO - Small footprint against photo Litho - Comparable to KrF, i-line Stepper - Monthly Capa. : 30K	- 20nm Pattern Resolution - Long life time sheet type mold - Easy loading / unloading - Easy job Change(Mold change) - R&D for WGP, nPSS, Fine nano pattern

Process Data