Related Products

ICP Etcher

• - 2inch-8inch Shpphire, Si, SiC, GaAs, LN/LT Substrate
• - PSS, GaN, 5iC, GaAs, Polymide, Metal, Dielectric films, Etc.
• - Tray Type(Conventional/Face Down)
• - Standalone (ESC, In-line Asher Optical)

Performance

• - PSS Lens : Symmetric Pyramidal Shape, (Height,Width) ±0.05㎛
• - Face-down Chamber (MAXIS800L) : Particle free, High throughput
• - Throughput (MAXIS300L/MAXIS800L) : Tray Type (2,4,6,8inch)
• - Dual Chiller and Dual Gas Flow (MAXIS800L)
• - Standalone_4,6,8inch,ESC/Mechanical Clamp available (MAXIS200L)
• - In-line VDS Asher for Metal Etcher (NeoGEN MAXIS200L_RADIION200)
• - ESC for Piezoelectric Substrate of SAW filter
• - SIC Trench or TSV etching