gigalane

Features

自动化设备运用
- 世界首个wafer scale full automated imprinting process wafer load/unload，coating，imprinting工程自动化

- 通过实现自动化确保批量生产：error最小化及污染最小化
实现 Low CoC/CoO
- 通过可重复使用的mold节约CoC

- 与Stepper相比，throughput的投资费用较低及维护费用显见（CoO）
真空UV imprint工艺
- 从数十nm级超微模式到um级超微模式实现

- 在hole、pillar、wall、trench等大部分模式中防止air void不良及确保高模式复制率

- 拥有3D lens、lenticular等一般photo工艺无法实现的图案的轻松生产能力

- 多种基板的可适用性（glass,、wafer、film）

- 多种基板尺寸适用性（4inch ~ 8inch）

- 世界最高水平的精密残膜控制能力：实现wafer scale均匀残膜并确保再现性

提供多种 model line up

Gigalane NANO-IMPRINTER	CITUS 6000FA

	Fully automatic Imprinter
Overview & Performance	- 4" ~ 6" wafer imprinting - Sub-100nm pattern resolution (Comparable with KrF scanner) - Fully automatic operation : Master mold → mold → imprint, no operator intervention - System integration, CITUS6000M(mold imprinter) + 6000R(wafer imprinter), in-line opertation - Easy job change(flexible pattern change while operation) variours master wafers can be loaded without any delay or loss during master change - Master mold loading : 12" ~ 8" wafer(cassette loading) - Motion monitoring systerm : Coating, imprintinig, wafer delivery, film moving, on-line CAM record - Resin mold repeatable (multiple usage) : Gaseous release coater in-line - Lower CoC & CoO : cost of consumable, cost of ownership - Very small footprint & simple process against photo stepper & wet(coating, developing) - LED, Display, Other Electric Devices PSS, Micro Lens Array, 3D structure, slanted structure and nano~micro scale patterning - Nomial monthly capacity : 30K/month, 60 wph(wafer per hour)

Gigalane NANO-IMPRINTER	CITUS 6000M for Mold	CITUS 6000R	CITUS 6000SA

	Mold Imprinter	Auto Imprinter	Manual Imprinter
Overview	- Master mold : 6inch ~ 12inch - Resin mold roll production - In-line Resin Coating (spray, ink jet, u-dispenser) - Roll to Plate Contact imprint - UV imprint(365nm)	- 4inch ~ 6inch - LED, Display, Optical Devices - Flexible Resin Mold(Roll to Roll) - In-line Coater(spin coater) - In-line Gaeous release treatment - Vacuum assisted UV imprint(365nm)	- 4inch ~ 6inch, Manual type - LED, Display, Optical Devices - Flexible Resin Mold - Coater/Demold optional - Vacuum assisted UV imprint(365nm)
Performance	- 20nm Pattern Resolution - Lower CoC & CoO - Monthly Capa. : 30K - Direct mold fabrication from master mold	- 20nm Pattern Resolution - Lower CoC & CoO - Small footprint against photo Litho - Comparable to KrF, i-line Stepper - Monthly Capa. : 30K	- 20nm Pattern Resolution - Long life time sheet type mold - Easy loading / unloading - Easy job Change(Mold change) - R&D for WGP, nPSS, Fine nano pattern

Process Data