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CCP ETCHER

CCP(Capacitively Coupled Plasma)作为最适合Dielectrics刻蚀的Plasma Source,Gigalain CCP刻蚀设备采用了多种最新技术,是确保高刻蚀选择性和均匀性的高性能CCP刻蚀设备。
Features
提供多种Flatform
  • NeoS-ADF200
  • NeoGEN-ADF200
  • NeoGENII-ADF200
Process Data
Oxide
ACL
Product